AMAT 0010-23716

AMAT 0010-23716

Manufacturer: Applied Materials, Inc. (AMAT)
Category: Semiconductor Manufacturing Equipment Component

Key Details:

1. Purpose:
   • This part is likely a critical component used in semiconductor fabrication equipment, such as:
     • Etch systems (plasma etchers)
     • Chemical Vapor Deposition (CVD) or Physical Vapor Deposition (PVD) chambers
     • Wafer handling modules or vacuum subsystems
   • It may serve functions like gas flow control, temperature regulation, or mechanical actuation within a larger tool.
2. Design Features:
   • Material: Engineered for high-precision and durability, possibly using ceramics, stainless steel, or specialty alloys resistant to corrosive gases or extreme temperatures.
   • Compatibility: Designed to integrate with AMAT’s advanced semiconductor tools (e.g., Endura®, Centura®, or Producer® platforms).
   • Certifications: Likely meets stringent industry standards (SEMI, ISO) for cleanliness, particle control, and reliability.
3. Applications:
   • Used in the production of integrated circuits (ICs), memory chips (DRAM, NAND), or advanced logic devices.
   • May support processes like atomic layer deposition (ALD), ion implantation, or wafer cleaning.
4. Technical Considerations:
   • Precision: Critical for maintaining process uniformity and yield in nanoscale semiconductor manufacturing.
   • Maintenance: Likely requires periodic calibration or replacement due to wear in high-vacuum or plasma environments